Size: 1-5um (minimum size can be customised to 50nm)
Properties: High purity and excellent electrochemical properties.
Functional group: -Cl (can be customised)
Purity: 99 per cent
Storage conditions: dry at room temperature and keep away from light
Process: Beike high temperature vapour phase etching process
Performance characteristics: the traditional liquid-phase method of Ta4C3-Cl MXene etching is extremely difficult and long etching rate is low etching insufficient, the gas-phase method because of high-temperature annealing between the layers without the presence of moisture can be stable and maintain high activity.