The TEM silicon nitride film pane produced by Beike Nano is produced by advanced microelectronics technology and can be used for high-resolution electron microscopy observation of micro-nano samples. This pane is an octagon with a 3mm outer diameter and is suitable for all TEM sample rods. To be suitable for a variety of experimental conditions, Beike Nano provides scientific researchers with single pane, multi pane and micropore pane standard product. The silicon nitride film adopts low-stress technology (<250MPa). The silicon nitride film is thin and not easily damaged. It is very suitable for cutting-edge research in biology, materials, physics, and chemistry.

Features

Technical Parameters

Outer frame items	parameter	Outer frame items	parameter
material	N -type silicon	Resistivity	1 ~ 10 Ω-cm
Silicon nitride film parameters	parameter	Silicon nitride film parameters	parameter
material	LPCVD silicon nitride film	stress	<250MPa
Dielectric constant	6-7	Dielectric strength	10 (10 6 V / cm)
Resistivity	10 16 Ω-cm	Roughness (Ra)	0.28 ± 5% nm
Young‘s modulus	270GPa	Roughness (Rms)	0.40 ± 5% nm

Application range

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Nano materials, semiconductor materials, optical crystal materials, functional thin film materials

Characterization experiments of colloids, aerogels, organic materials and nanoparticles

Analysis of carbon-containing samples (photoresist, polymer, food, oil, fuel, etc.)

As a biological and cellular carrier

Product specification

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- the TEM single-pane silicon nitride film -

Substrate 200um thick, 3mm diameter standard TEM silicon nitride window

Product ID	Film thickness	Window size	Buy now
SG010Z	10nm	0.10 × 0.10mm
SG015Z	10nm	0.15 × 0.15mm
SG025Z	10nm	0.25 × 0.25mm
SG050Z	10nm	0.50 × 0.50mm
SG025A	15nm	0.25x0.25mm
SG050A	15nm	0.5x0.5mm
SG100A	15nm	1x1mm
SG025B	30nm	0.25x0.25mm
SG050B	30nm	0.5x0.5mm
SG100B	30nm	1x1mm
SG025C	50nm	0.25x0.25mm
SG050C	50nm	0.5x0.5mm
SG100C	50nm	1x1mm
SG050D	100nm	0.5x0.5mm
SG025E	200nm	0.25x0.25mm
SG050E	200nm	0.5x0.5mm
Each box contains 10 chips

- TEM multi-pane silicon nitride film -

Multi-window array, substrate 200um thick, 3mm diameter standard TEM silicon nitride pane

Product ID	Film thickness	Window size	Number of windows	Window pitch
AR010Z	10nm	0.1x0.1mm	9	0.35nm
AR010A	15nm	0.1x0.1mm	9	0.35mm
AR010B	30nm	0.1x0.1mm	9	0.35mm
AR010C	50nm	0.1x0.1mm	9	0.45mm
TA015A	15nm	0.1x1.5mm	2	0.45mm
TA015C	50nm	0.1x1.5mm	2	0.45mm
Each box contains 10 chips

- the TEM microporous silicon nitride film -

Micro-hole array, substrate 200um thick, 3mm diameter standard TEM silicon nitride pane

Product ID	Film thickness	Window size	Aperture	Array	Hole spacing
ME050B	30nm	0.5x0.5mm	2.8μm	45x45	10μm
ME050C	50nm	0.5x0.5mm	2.0μm	45x45	10μm
ME050C10	50nm	0.5x0.5mm	10μm	32x32	15μm
ME050E05	200nm	0.5x0.5mm	5μm	49x49	10μm
Each box contains 10 chips

—— TEM nanoporous silicon nitride film ——

Micro-hole array, substrate 200um thick, 3mm diameter standard TEM silicon nitride pane

Product ID	Film thickness	Window size	Aperture	Array	Hole spacing
NE005C10	50nm	50 × 50μm	1.0μm	15x15	2.0um
NE050C10	50nm	0.5x0.5mm	1.0μm	15x15x4	5.0μm
NE005E10	200nm	50 × 50μm	1.0μm	15x15	2.0μm
NE050E10	200nm	0.5x0.5mm	1.0μm	15x15x4	5.0μm
Each box contains 10 chips