Two-dimensional material micro-nano processing - in situ testing Two-dimensional material micro-nano processing - in situ testing> Design and processing

²úÆ·:TSV through hole

Detailed

TSV technology (through-silicon through-hole technology), generally referred to as through-silicon through-hole technology, is a new technical solution for interconnecting stacked chips in three-dimensional integrated circuits. TSV can make the density of the chips stacked in the three-dimensional direction the largest, the shortest interconnection between the chips, the smallest size, and greatly improve the performance of chip speed and low power consumption. Beike Nano masters the latest TSV technology, which can help customers to complete TSV personalized requirements.

Technology application

As one of the most promising technologies in microelectronics manufacturing, TSV technology has been widely used in MEMS devices, memory, image sensors, power amplifiers, biological application equipment and various mobile phone chips.

Process capability

Through hole diameter: 20-30um Aspect ratio: 10: 1 Through-hole materials: copper, gold Through hole status: solid hole, hollow hole

Our advantage

Graphics can be customized High through hole yield Can be mass produced Process technology is mature


Warm tip: the products supplied by Beijing Beike Xincai Technology Co., Ltd. are only used for scientific research, not for human body


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