Two-dimensional material micro-nano processing - in situ testing Two-dimensional material micro-nano processing - in situ testing> GaN wafer

产品:4-inch GaN thick film wafer (undoped)

Detailed

Performance parameters:

  • Product number GaN-T-C-U-C100
    Size Ф 100 ± 0.1 mm
    Thickness 4.5±0.5 μm, 20±2 μm
    Crystal orientation C-plane(0001) ± 0.5°
    Conductivity type N-type(Undoped)
    Resistivity (300 K) < 0.5Ω·cm
    Carrier concentration < 5x1017cm-3
    Mobility ~ 300cm2/V•s
    Dislocation density Less than 5x108 cm-2(estimated by FWHMs of XRD)
    Substrate structure GaN on sapphire (standard :SSP option:DSP)
    Effective area >90%
    package Packaged in a class 100 clean room environment, in cassette of 25pcs
    or single container , under a nitrogen atmosphere.




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Item ID Info
BK2020081710-01 CAS:
ID:BK2020081710
Pack:
Parameter:4.5±0.5μm
Stock:100
Make up:
Price:$660
BK2020081710-02 CAS:
ID:BK2020081710
Pack:
Parameter:20±2μm
Stock:100
Make up:
Price:$860
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