Two-dimensional material micro-nano processing - in situ testing Two-dimensional material micro-nano processing - in situ testing> GaN wafer

产品:4-inch GaN thick film wafer (Si doped)

Detailed

Performance parameters:

  • Product number GaN-T-C-N-C100
    Size Ф 100 ± 0.1 mm
    Thickness 4.5±0.5 μm, 20±2 μm
    Crystal orientation C-plane(0001) ± 0.5°
    Conductivity type N-type(Si-doped)
    Resistivity (300 K) < 0.05Ω·cm
    Carrier concentration >  1x1018cm-3
    Mobility ~ 200cm2/V•s
    Dislocation density Less than 5x108 cm-2(estimated by FWHMs of XRD)
    Substrate structure GaN on sapphire (standard :SSP option:DSP)
    Effective area >90%
    package Packaged in a class 100 clean room environment, in cassette of 25pcs
    or single container , under a nitrogen atmosphere.




Warm tip: the products supplied by Beijing Beike Xincai Technology Co., Ltd. are only used for scientific research, not for human body


Item ID Info
BK2020081711-01 CAS:
ID:BK2020081711
Pack:
Parameter:4.5±0.5μm
Stock:100
Make up:
Price:$660
BK2020081711-02 CAS:
ID:BK2020081711
Pack:
Parameter:20±2μm
Stock:100
Make up:
Price:$860
Copyright © beijing beike new material Technology Co., Ltd 京ICP备16054715-2号