Two-dimensional material micro-nano processing - in situ testing Two-dimensional material micro-nano processing - in situ testing> GaN wafer

产品:2-inch GaN thick film wafer (Si doped)

Detailed

Performance parameters:

  • Product number GaN-T-C-N-C50
    Size Ф50.8 ± 0.1 mm
    Thickness 4.5±0.5 μm, 20±2 μm
    Crystal orientation C-plane(0001) ± 0.5°
    Conductivity type N-type(Si-doped)
    Resistivity (300 K) < 0.05Ω·cm
    Carrier concentration >  1x1018cm-3
    Mobility ~ 200cm2/V•s
    Dislocation density Less than 5x108 cm-2(estimated by FWHMs of XRD)
    Substrate structure GaN on sapphire (standard :SSP option:DSP)
    Effective area >90%
    package Packaged in a class 100 clean room environment, in cassette of 25pcs
    or single container , under a nitrogen atmosphere.




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Item ID Info
BK2020081713-01 CAS:
ID:BK2020081713
Pack:单抛
Parameter:4.5±0.5μm
Stock:100
Make up:
Price:$140
BK2020081713-02 CAS:
ID:BK2020081713
Pack:单抛
Parameter:20±2μm
Stock:100
Make up:
Price:$270
BK2020081713-03 CAS:
ID:BK2020081713
Pack:双抛
Parameter:4.5±0.5μm
Stock:100
Make up:
Price:$150
BK2020081713-04 CAS:
ID:BK2020081713
Pack:双抛
Parameter:20±2μm
Stock:100
Make up:
Price:$280
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