产品:2-inch GaN thick film wafer (Si doped)
Detailed
Performance parameters:
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Product number GaN-T-C-N-C50 Size Ф50.8 ± 0.1 mm Thickness 4.5±0.5 μm, 20±2 μm Crystal orientation C-plane(0001) ± 0.5° Conductivity type N-type(Si-doped) Resistivity (300 K) < 0.05Ω·cm Carrier concentration > 1x1018cm-3 Mobility ~ 200cm2/V•s Dislocation density Less than 5x108 cm-2(estimated by FWHMs of XRD) Substrate structure GaN on sapphire (standard :SSP option:DSP) Effective area >90% package Packaged in a class 100 clean room environment, in cassette of 25pcs
or single container , under a nitrogen atmosphere.
Warm tip: the products supplied by Beijing Beike Xincai Technology Co., Ltd. are only used for scientific research, not for human body |
Item ID | Info |
BK2020081713-01 | CAS: ID:BK2020081713 Pack:单抛 Parameter:4.5±0.5μm Stock:100 Make up: Price:$140 |
BK2020081713-02 | CAS: ID:BK2020081713 Pack:单抛 Parameter:20±2μm Stock:100 Make up: Price:$270 |
BK2020081713-03 | CAS: ID:BK2020081713 Pack:双抛 Parameter:4.5±0.5μm Stock:100 Make up: Price:$150 |
BK2020081713-04 | CAS: ID:BK2020081713 Pack:双抛 Parameter:20±2μm Stock:100 Make up: Price:$280 |
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