Two-dimensional material micro-nano processing - in situ testing Two-dimensional material micro-nano processing - in situ testing> Micro and nano devices

产品:MoSe2 FET array, CVD MoSe2 FET array

Detailed

Back gate device structure: gold electrode array/CVD monolayer MoSe2 array/300nm SiO2/Si



1) Device type 1, 10*10 or 15*15 FET array, 5um channel, 300nm silicon oxide silicon substrate, back gate structure





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Item ID Info
BK2022062007 CAS:
ID:BK2022062007
Pack:一片装
Parameter:
Stock:100
Make up:
Price:$2062
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