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High Temperature Multilayer Vapour Phase T2N-Cl MXene





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Size: 1-5um (minimum size can be customised to 50nm)
Properties: High purity and excellent electrochemical properties.
Functional group: -Cl (can be customised)
Purity: 99 per cent
Storage conditions: dry at room temperature and keep away from light
Process: Beike high temperature vapour phase etching process
Performance characteristics: the traditional liquid-phase method of Ti2N-Cl MXene etching is extremely difficult and long etching rate is low etching is not sufficient, the gas-phase method because there is no moisture between the layers after high-temperature annealing can be stable and maintain high activity.
Process details: multi-layer organ-shaped MXene material, Beike unique fumed method of etching completed without any liquid phase etching can maintain high stability and antioxidant properties, air stability is very good, air six months without significant attenuation can provide a single batch of 50kg class supply.

Warm tip: the products supplied by Beijing Beike Xincai Technology Co., Ltd. are only used for scientific research, not for human body

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Reminder: Beijing Beike New Material Technology Co., Ltd. supplies products only for scientific research, not for humans
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