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Photo ID/CAS Item ID Name/specification price

Melting point: 254 degrees Bismuth-zinc alloy temperature control alloy die alloy Fusible alloy Bi-based alloy BK2020081805
  Melting point: 254 degrees Bismuth-zinc alloy temperature control alloy die alloy Fusible alloy Bi-based alloy
BK2020081805-01 100g
$ 13
Melting point: 262 degrees, metal alloy, temperature control alloy, fusible alloy, ultra-low temperature alloy, die alloy BK2020081804
  Melting point: 262 degrees, metal alloy, temperature control alloy, fusible alloy, ultra-low temperature alloy, die alloy
BK2020081804-01 100g
$ 25
Melting point 240 degrees Bi-gold alloy temperature control alloy Fusible alloy Ultra-low temperature alloy Bi-based alloy BK2020081803
  Melting point 240 degrees Bi-gold alloy temperature control alloy Fusible alloy Ultra-low temperature alloy Bi-based alloy
BK20200818030-01 1g
$ 25
Melting point 70 degrees Wood‘s alloy bismuth tin lead temperature control alloy fusible alloy ultra-low temperature alloy die alloy BK2020081802
  Melting point 70 degrees Wood‘s alloy bismuth tin lead temperature control alloy fusible alloy ultra-low temperature alloy die alloy
BK2020081802-01 100g
$ 120
30 degree low temperature single metal BK2020081801
  30 degree low temperature single metal
BK2020081801-03 试管
BK2020081801-02 10克/管
BK2020081801-01 1Kg/瓶
$ 242
2 inch aluminum nitride thick film wafer BK2020081715
  2 inch aluminum nitride thick film wafer
BK2020081715-08 双抛厚度:[4,5)μm
BK2020081715-07 双抛厚度:[3,4)μm
BK2020081715-06 双抛厚度:[2,3)μm
BK2020081715-05 双抛厚度:[1,2)μm
BK2020081715-04 单抛厚度:[4,5)μm
BK2020081715-03 单抛厚度:[3,4)μm
BK2020081715-02 单抛厚度:[2,3)μm
BK2020081715-01 单抛厚度:[1,2)μm
$ 500
2-inch GaN thick film wafer (Mg doped) BK2020081714
  2-inch GaN thick film wafer (Mg doped)
BK2020081714-02 双抛4.5±0.5μm
BK2020081714-01 单抛4.5±0.5μm
$ 180
2-inch GaN thick film wafer (Si doped) BK2020081713
  2-inch GaN thick film wafer (Si doped)
BK2020081713-04 双抛20±2μm
BK2020081713-03 双抛4.5±0.5μm
BK2020081713-02 单抛20±2μm
BK2020081713-01 单抛4.5±0.5μm
$ 140
2-inch GaN thick film wafer (undoped) BK2020081712
  2-inch GaN thick film wafer (undoped)
BK2020081712-04 双抛20±2μm
BK2020081712-03 双抛4.5±0.5μm
BK2020081712-02 单抛20±2μm
BK2020081712-01 单抛4.5±0.5μm
$ 120
4-inch GaN thick film wafer (Si doped) BK2020081711
  4-inch GaN thick film wafer (Si doped)
BK2020081711-02 20±2μm
BK2020081711-01 4.5±0.5μm
$ 660
4-inch GaN thick film wafer (undoped) BK2020081710
  4-inch GaN thick film wafer (undoped)
BK2020081710-02 20±2μm
BK2020081710-01 4.5±0.5μm
$ 660
Non-polar/semi-polar GaN self-supporting substrate (SP surface) BK2020081709
  Non-polar/semi-polar GaN self-supporting substrate (SP surface)
BK2020081709-04 Semi-insulating5*20.5mm2
BK2020081709-03 Semi-insulating5*10.5mm2
BK2020081709-02 Un-doped5*20.5mm2
BK2020081709-01 Un-doped5*10.5mm2
$ 600
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