SOI base WS2

The company can currently manufacture high-quality single-layer WS2 films in batches.

Currently the largest size 4 inch wafers, larger sizes (8, 12 inches) will be available soon.

Manufacturing method:

Chemical Vapor Deposition, Chemical Vapor Deposition (CVD)

Product introduction:

WS2 thin films are divided into various types:
1) Single-layer discretely distributed triangle-shaped single crystal grains, the triangle side length is generally tens to 100 microns.
2) The single-layer continuous film of Dalian continues to grow from triangular grains.
3) Multi-layer WS2 continuous film.
4) Substrate: WS2 has many optional substrates, among which the most commonly used sapphire substrates are direct deposition products. Other substrates such as PET, PI, ITO, FTO, glass, metal substrates, etc. are transferred to the substrates required by customers after growing on sapphire.

Application areas:

Optoelectronic devices, microelectronic devices, biological sensing, chemical sensing and other fields.

Packaging and specifications

10*10mm, 15*15mm, 20*20mm, 2 inch wafer, 4 inch wafer or customized size specified by the customer.
Purified vacuum packaging, 1 piece/box, 5 pieces/box. 10 pieces/box.

Typical customers include:

MIT, Caltech, Stanford University;
the University of Oxford, University of Manchester;
Seoul National University, KAIST (KAIST), Sungkyunkwan University;
Tokyo Institute of Technology, Murata
, Tsinghua University, Peking University, Institute of Semiconductors
and other world-class research mechanism.

Single layer WS2 isolated grain

Single layer WS2 continuous film

Single and double layer mixed WS2

Sapphire-based single layer WS2 (4 inches)