WS2 on FTO substrate

Our company is currently able to manufacture high quality monolayer WS2  films.
The largest 4 inch discs are currently available, and larger sizes (8, 12 inches) are coming soon.

Production method:

Chemical Vapor Deposition （CVD）

Product introduction:

WS2 films have sevaral kinds:
1) A single-layer discretely distributed triangular single crystal grain whose triangular side length is generally several tens to one hundred micrometers.
2) A single-layer continuous film that continues to grow in Dalian by triangular grains.
3) Multilayer WS2 continuous film.
4) Substrate: WS2 has many optional substrates, among which the most commonly used silicon substrate, the oxide silicon substrate and the sapphire substrate are direct deposition products. Other substrates such as PET, PI, ITO, FTO, glass, metal substrates, etc. are transferred to the substrate desired by the customer after growth on sapphire.

Application fields:

Optoelectronic devices, microelectronic devices, biosensing, chemical sensing and other fields.

Packaging and specifications:

10 * 10mm, 15 * 15mm, 20 * 20mm, 2" disc, 4" disc or custom size specified by the customer.
Purification vacuum packaging, 1 piece / box, 5 pieces / box. 10 pieces / box.

Typical customers include:

Massachusetts Institute of Technology, California Institute of Technology, Stanford University;
Oxford University, Manchester University;
Seoul National University, Korea Institute of Science and Technology (KAIST), Sungkyunkwan University;Tokyo Institute of Technology, Murata Manufacturing Co., Ltd.,Tsinghua University, Peking University, Institute of Semiconductors, Chinese Academy of Sciences,And other world-class research institutions.

Single layer WS2 isolated grain

Single layer WS2 continuous film

Single layer and double layer WS2 mixed film

Single layer WS2 on sapphire substrate (4 inch)