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CVD TMDC 2D thin film / heterojunction
Mechanical peeling single layer material customization MoS2/TiS3 titanium trisulfide molybdenum disulfide heterojunction Black phosphorus ReSe2 heterojunction device, BP/ReSe2 Custom stripped heterojunction devices
ReS2/ReSe2 heterojunction Disulfide bond modification Silicon nitride film CVD-graphene
Boron nitride film MoS2 / WS2 / hBN / Graphene heterojunction MX2 / MX2 / hBN / graphene heterojunction MX2 / hBN heterojunction
MX2 / graphene heterojunction ReSe2 thin film Tin diselenide SnSe2 film Antimony telluride Sb2Te3 film
Bi2Te3 thin film Bi2Se3 thin film Tin disulfide SnS2 film MoSe2 film
MoTe2 film NiTe2 film Rhenium disulfide ReS2 film WS2 film
WSe2 film PdSe2 film MoS2 film PtSe2 film
price
500元    501-1000元    1001-2000元    2000元以上

Photo ID/CAS Item ID Name/specification price

High resistance intrinsic MoS2 on Si substrate (>10000ohm.cm) BKTMDC123031
  High resistance intrinsic MoS2 on Si substrate (>10000ohm.cm)
BKTMDC123031-03 多层连续薄膜
BKTMDC123031-02 单层连续薄膜
BKTMDC123031-01 单层三角单晶晶粒
$ 580
MoS2 on SrTiO3 substrate BKTMDC123032
  MoS2 on SrTiO3 substrate
BKTMDC123032-03 多层连续薄膜
BKTMDC123032-02 单层连续薄膜
BKTMDC123032-01 单层三角单晶晶粒
$ 580
MoS2 on Mica substrate BKTMDC123033
  MoS2 on Mica substrate
BKTMDC123033-03 多层连续薄膜
BKTMDC123033-02 单层连续薄膜
BKTMDC123033-01 单层三角单晶晶粒
$ 560
MoS2 on FTO substrate BKTMDC123034
  MoS2 on FTO substrate
BKTMDC123034-03 多层连续薄膜
BKTMDC123034-02 单层连续薄膜
BKTMDC123034-01 单层三角单晶晶粒
$ 435
MoS2 on ITO substrate BKTMDC123035
  MoS2 on ITO substrate
BKTMDC123035-03 多层连续薄膜
BKTMDC123035-02 单层连续薄膜
BKTMDC123035-01 单层三角单晶晶粒
$ 560
MoS2 on flexible PET substrate BKTMDC123036
  MoS2 on flexible PET substrate
BKTMDC123036-01 10mm*10mm
$ 560
MoS2 on quartz substrate BKTMDC123037
  MoS2 on quartz substrate
BKTMDC123037-02 0.5mm单层三角单晶晶粒/单层连续薄膜/多层连续薄膜
BKTMDC123037-01 1mm单层三角单晶晶粒/单层连续薄膜/多层连续薄膜
$ 400
MoS2 on sapphire substrate BKTMDC123038
  MoS2 on sapphire substrate
BKTMDC123038-02 双面抛光单层三角单晶晶粒 单层连续薄膜 多层连续薄膜
BKTMDC123038-01 单面抛光单层三角单晶晶粒 单层连续薄膜 多层连续薄膜
$ 460
MoS2 on SiO2/Si substrate(Oxide film thickness not 300nmˈ) BKTMDC123039
  MoS2 on SiO2/Si substrate(Oxide film thickness not 300nmˈ)
BKTMDC123039-02 其他厚度尺寸10*10mm单层三角单晶晶粒/单层连续薄膜/多层连续薄膜
BKTMDC123039-01 300nm尺寸10*10mm单层三角单晶晶粒/单层连续薄膜/多层连续薄膜
$ 460
MoS2 on SiO2/Si substrate(Oxide film thickness 300nmˈ) BKTMDC123040
  MoS2 on SiO2/Si substrate(Oxide film thickness 300nmˈ)
BKTMDC123040-02 其他厚度单层三角单晶晶粒/单层连续薄膜/多层连续薄膜
BKTMDC123040-01 300nm单层三角单晶晶粒/单层连续薄膜/多层连续薄膜
$ 460
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