registered   |   log in
  中文

CVD TMDC 2D thin film / heterojunction
Mechanical peeling single layer material customization MoS2/TiS3 titanium trisulfide molybdenum disulfide heterojunction Black phosphorus ReSe2 heterojunction device, BP/ReSe2 Custom stripped heterojunction devices
ReS2/ReSe2 heterojunction Disulfide bond modification Silicon nitride film CVD-graphene
Boron nitride film MoS2 / WS2 / hBN / Graphene heterojunction MX2 / MX2 / hBN / graphene heterojunction MX2 / hBN heterojunction
MX2 / graphene heterojunction ReSe2 thin film Tin diselenide SnSe2 film Antimony telluride Sb2Te3 film
Bi2Te3 thin film Bi2Se3 thin film Tin disulfide SnS2 film MoSe2 film
MoTe2 film NiTe2 film Rhenium disulfide ReS2 film WS2 film
WSe2 film PdSe2 film MoS2 film PtSe2 film
price
500元    501-1000元    1001-2000元    2000元以上

Photo ID/CAS Item ID Name/specification price

MoSe2 based on SiO2/Si substrate    oxide thickness NOT 300nm BKTMDC123022
  MoSe2 based on SiO2/Si substrate oxide thickness NOT 300nm
BKTMDC123022-06 其他厚度多层连续薄膜
BKTMDC123022-05 30nm多层连续薄膜
BKTMDC123022-04 其他厚度单层连续薄膜
BKTMDC123022-03 30nm单层连续薄膜
BKTMDC123022-02 其他厚度单层三角单晶晶粒
BKTMDC123022-01 30nm单层三角单晶晶粒
$ 460
MoSe2 based on SiO2/Si substrate    oxide thickness 300nm BKTMDC123023
  MoSe2 based on SiO2/Si substrate oxide thickness 300nm
BKTMDC123023-02 其他厚度单层三角单晶晶粒/单层连续薄膜/多层连续薄膜
BKTMDC123023-01 300nm单层三角单晶晶粒/单层连续薄膜/多层连续薄膜
$ 900
MoS2 on TEM copper network substrate BKTMDC123024
  MoS2 on TEM copper network substrate
BKTMDC123024-03 多层连续薄膜
BKTMDC123024-02 单层连续薄膜
BKTMDC123024-01 单层三角单晶晶粒
$ 620
MoS2 on GaAs substrate BKTMDC123025
  MoS2 on GaAs substrate
BKTMDC123025-03 多层连续薄膜
BKTMDC123025-02 单层连续薄膜
BKTMDC123025-01 单层三角单晶晶粒
$ 620
MoS2 on copper substrate BKTMDC123026
  MoS2 on copper substrate
BKTMDC123026-03 多层连续薄膜
BKTMDC123026-02 单层连续薄膜
BKTMDC123026-01 单层三角单晶晶粒
$ 560
MoS2 on silver substrate BKTMDC123027
  MoS2 on silver substrate
BKTMDC123027-03 多层连续薄膜
BKTMDC123027-02 单层连续薄膜
BKTMDC123027-01 单层三角单晶晶粒
$ 570
MoS2 on gold substrate BKTMDC123028
  MoS2 on gold substrate
BKTMDC123028-03 多层连续薄膜
BKTMDC123028-02 单层连续薄膜
BKTMDC123028-01 单层三角单晶晶粒
$ 590
MoS2 on SOI substrate BKTMDC123030
  MoS2 on SOI substrate
BKTMDC123030-03 多层连续薄膜
BKTMDC123030-02 单层连续薄膜
BKTMDC123030-01 单层三角单晶晶粒
$ 620
High resistance intrinsic MoS2 on Si substrate (>10000ohm.cm) BKTMDC123031
  High resistance intrinsic MoS2 on Si substrate (>10000ohm.cm)
BKTMDC123031-03 多层连续薄膜
BKTMDC123031-02 单层连续薄膜
BKTMDC123031-01 单层三角单晶晶粒
$ 580
MoS2 on SrTiO3 substrate BKTMDC123032
  MoS2 on SrTiO3 substrate
BKTMDC123032-03 多层连续薄膜
BKTMDC123032-02 单层连续薄膜
BKTMDC123032-01 单层三角单晶晶粒
$ 580
MoS2 on Mica substrate BKTMDC123033
  MoS2 on Mica substrate
BKTMDC123033-03 多层连续薄膜
BKTMDC123033-02 单层连续薄膜
BKTMDC123033-01 单层三角单晶晶粒
$ 560
MoS2 on FTO substrate BKTMDC123034
  MoS2 on FTO substrate
BKTMDC123034-03 多层连续薄膜
BKTMDC123034-02 单层连续薄膜
BKTMDC123034-01 单层三角单晶晶粒
$ 435

 

Reminder: Beijing Beike New Material Technology Co., Ltd. supplies products only for scientific research, not for humans
All rights reserved © 2019 beijing beike new material Technology Co., Ltd 京ICP备16054715-2号
advisory
phone
Email:mxenes@163.com
Tel:+86-17715390137
scan

scan
WeChat