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Two-dimensional material micro-nano processing - in situ testing
Two dimensional material transfer system Heterojunction customization Customized wafer consumables Micro and nano devices
Electrode customization Transient absorption spectrum Monocrystalline silicon substrate GaN wafer
FET devices Two-dimensional material device Design and processing Photoelectric comprehensive test system
Photocurrent test system Spectrum test system
price
500元    501-1000元    1001-2000元    2000元以上

Photo ID/CAS Item ID Name/specification price

PI process BK20200003
  PI process
$ 0
Bonding process BK20200004
  Bonding process
$ 0
Etching process BK20200005
  Etching process
$ 0
Coating process BK20200006
  Coating process
$ 0
Lithography BK20200007
  Lithography
$ 0
Two-dimensional material device BK2020000801
  Two-dimensional material device
$ 0
MoS2 / WS2 corner heterojunction (WSe2, MoSe2) BKTMDC123101
  MoS2 / WS2 corner heterojunction (WSe2, MoSe2)
BKTMDC123101-11 MX2/hBN/Graphene
BKTMDC123101-10 MoSe2/MoSe2
BKTMDC123101-09 WSe2/MoSe2
BKTMDC123101-08 WSe2/WSe2
BKTMDC123101-07 WS2/MoSe2
BKTMDC123101-06 WS2/WSe2
BKTMDC123101-05 WS2/WS2
BKTMDC123101-04 MoS2/MoSe2
BKTMDC123101-03 MoS2/WSe2
BKTMDC123101-02 MoS2/WS2
BKTMDC123101-01 MoS2/MoS2
$ 1362

 

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